Nanofabrication with focused electron and ion beams
MSE-619 / 2 crédits
Enseignant(s): Hoffmann Patrik Willi, Utke Ivo
Langue: Anglais
Remark: Next time: November 13, 14, 18 and 20, 2024
Frequency
Every 2 years
Summary
Nanofabrication with focused charged particle beams (SEM, FIB) and their applications such as lithography, gas assisted deposition / etching, and milling are discussed and the limitations of these processes are developed based on the acquired understanding of the interactions.
Content
- Introduction to Scanning Electron / Ion Microscopes: SEM, Ga-FIB, He-FIB, AuSi-FIB
- Electron / Ion interaction with solids: concepts and simulations
- Analysis with focused electron and ion beams: EDX, EBIC, EBSD, tomography
- Nanofabrication with FIB and FEB: milling, deposition, etching, lithography
- Novel Add-Ons for Nanomanipulation and Nanoanalysis inside electron microscopes: 4-point electrical measurements, positioning systems for nanostructures, magnetic bead detection, mechanical measurements: tensile, bending, and compressive loading of nanostructures, 3D topography with in-situ atomic force microscopy, chemical depth profiling by combined FIB-mass spectroscopy. Live demonstrations: Add-ons, SEM, Dual Beam.
Keywords
FIB, FEB, nanofabrication, integrated setups for in-situ measurements (chemical, mechanical, structural, electronical) of nanostructures and their in-situ synthesis (gas injection)
Learning Prerequisites
Recommended courses
Physics and Chemistry at university level, general concepts of NanoSciences and Fabrication
Assessment methods
Exposé
Dans les plans d'études
- Nombre de places: 20
- Forme de l'examen: Exposé (session libre)
- Matière examinée: Nanofabrication with focused electron and ion beams
- Cours: 12 Heure(s)
- Exercices: 8 Heure(s)
- TP: 8 Heure(s)
- Type: optionnel
- Nombre de places: 20
- Forme de l'examen: Exposé (session libre)
- Matière examinée: Nanofabrication with focused electron and ion beams
- Cours: 12 Heure(s)
- Exercices: 8 Heure(s)
- TP: 8 Heure(s)
- Type: optionnel