EE-532 / 2 credits

Teacher: Sallese Jean-Michel

Language: English


Summary

This course will give an overview of some of the most relevant aspects of CMOS technology used to design and fabricate integrated circuits. Current research and challenges brought about by shrinking Field Effect Transistors down to the nm scale will also be tackled.

Content

Keywords

Silicon

CMOS

MOSFET

SOI

Implantation.

Etchning.

Annealing

isolation

oxide

 

Learning Prerequisites

Important concepts to start the course

No prequisite is needed, however very basic knowledge about MOSFET principles is welcome.

Learning Outcomes

By the end of the course, the student must be able to:

  • Synthesize informations on technology processes
  • Classify technological steps to fabricate an IC
  • Visualize the process flow

Transversal skills

  • Set objectives and design an action plan to reach those objectives.

Teaching methods

Class lectures.

Correction of exercices left for home work.

Expected student activities

Some training exercices.

Assessment methods

Written examination without documents:

Balance between question on the course content and exercices

In the programs

  • Semester: Fall
  • Exam form: Written (winter session)
  • Subject examined: Integrated circuits technology
  • Lecture: 2 Hour(s) per week x 14 weeks
  • Semester: Fall
  • Exam form: Written (winter session)
  • Subject examined: Integrated circuits technology
  • Lecture: 2 Hour(s) per week x 14 weeks
  • Semester: Fall
  • Exam form: Written (winter session)
  • Subject examined: Integrated circuits technology
  • Lecture: 2 Hour(s) per week x 14 weeks

Reference week

 MoTuWeThFr
8-9     
9-10     
10-11     
11-12     
12-13     
13-14     
14-15     
15-16     
16-17     
17-18     
18-19     
19-20     
20-21     
21-22