Coursebooks 2017-2018

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Caution, these contents corresponds to the coursebooks of last year


Thin film fabrication processes

MSE-465

Lecturer(s) :

Language:

English

Summary

The students will learn about the essential chemical, thermodynamic and physical mechanisms governing thin film growth, about the most important process techniques and their typical features, including process-microstructure relationships.

Content

* Introduction (Samples, applications, importance, history, overview).

* Major deposition methods with examples and typical applications: - evaporation - introduction to cold plasmas - sputter processes - reactive plasma processes - chemical vapour deposition (CVD) - plasma enhanced CVD - further methods including plasma surface treatments

* Nucleation and growth models

* Examples throughout the chapters on hard coatings, microelectronics, display technology, optics, coatings on polymers

Keywords

condensation from a vapour

Plasma and thermal activation

thin film growth models

non-equilibrium and equilibrium processes

Ion bombardment

Film morphology and micrstructure

wetting angle

Ad-atoms

Learning Prerequisites

Recommended courses

Basics courses on thermodynamics, physics, and chemistry

Learning Outcomes

By the end of the course, the student must be able to:

Transversal skills

Teaching methods

ex cathedra

exercices

demonstrations

Assessment methods

Continuous assessment and oral exam

Supervision

Office hours Yes
Assistants Yes

Resources

Bibliography

Copies of foils

Script on the web

recommended books

Websites

In the programs

Reference week

 MoTuWeThFr
8-9     
9-10     
10-11     
11-12     
12-13     
13-14     
14-15     
15-16     
16-17     
17-18     
18-19     
19-20     
20-21     
21-22     
 
      Lecture
      Exercise, TP
      Project, other

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  • Autumn semester
  • Winter sessions
  • Spring semester
  • Summer sessions
  • Lecture in French
  • Lecture in English
  • Lecture in German