Coursebooks 2017-2018

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Surface and thin films processes

CH-725

Lecturer(s) :

Karimi Ayat

Language:

English

Remarque

Next time: Fall 2018

Summary

Giving a basic knowledge of modern nanoscale thin film technology, characterisation techniques, emerging thin film materials,applications. To learn essential fundamental aspects&physical principles of thin film nucleation&growth from the vapour phase, understand the link between processing-structure

Content

1. Thermodynamic and kinetic theory concepts of surfaces in vacuum, statistical physics of adsorption/desorption at low coverage

2. Physical and chemical vapour deposition principles, ion-surface interactions, momentum transfer, sputter yield, DC and RF sputtering

3. Kinetic theory of gases and vapour, mean free path, condensation on substrate, atom-istic processes, thermal accommodation, binding, surface diffusion

4. Nucleation and growth, surface energy, interface energy, cluster coalescence and de-pletion, island growth, layer by layer growth, film morphology, extended structure zone models

5. Preferred orientation and texture; evolutionary selection model, fractal clustering and shadowing effects, surface energy and self-arrangement, elastic strain and total ener-gy minimization, adatom mobility and competitive growth

6. Origin of stresses in thin films, self assembly and self organisation in nanostructure thin films

7. X-ray diffraction techniques, electron and ion based spectroscopy methods to charac-terise thin films

8. Nanomechanic, nanotribology and adhesion to underlying substrate

9. Nanoscale engineering and design of thin films

10. New insights from first-principle abinitio calculations

11. Emerging thin films and applications

Note

Next session Fall semester 2017

Keywords

High pressure, pressure effect, high pressure gases, activation volume, reaction volume