Coursebooks 2017-2018

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Caution, these contents corresponds to the coursebooks of last year


Micro and nanostructuration of materials

MSE-461

Lecturer(s) :

Muralt Paul

Language:

English

Summary

This course gives an introduction to micro and nano structuration of materials, mainly of thin films. The mastering of patterning techniques is a core competence to establish technology for communication and informatics. The fast advancement in this field requires an almost annual update.

Content

  1. Introduction
  2. Photolithography down to 20 nm's
  3. Electron beam lithography
  4. Wet etching - anisotropic wet etching of silicon
  5. Dry etching techniques
  6. Nano imprint techniques
  7. Approaches to self assembly

 

Keywords

Principles of photo lithography, limits of optical resolution, photo resists, cold plasmas for dry etching, electrochemical processes in wet etching, interaction of e-beams with matter, self assembled monolayers, nucleation phenomena,

Learning Prerequisites

Required courses

basics in physics and chemistry

Recommended courses

-

Learning Outcomes

By the end of the course, the student must be able to:

Transversal skills

Teaching methods

ex-cathedra with exercises and demonstrations

Expected student activities

learn, read, and make exercices

Assessment methods

Oral exam at the end

Supervision

Office hours Yes
Assistants Yes

Resources

Bibliography

 

 

 

Notes/Handbook

Printed foils handed out and available as pdf

Websites

In the programs

Reference week

 MoTuWeThFr
8-9     
9-10     
10-11     
11-12     
12-13     
13-14     
14-15     
15-16     
16-17     
17-18     
18-19     
19-20     
20-21     
21-22     
Under construction
 
      Lecture
      Exercise, TP
      Project, other

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  • Autumn semester
  • Winter sessions
  • Spring semester
  • Summer sessions
  • Lecture in French
  • Lecture in English
  • Lecture in German